Greetings from Greece and the iplasmanano conference! I am very happy to announce that Dr. Nicolas Boscher from the Luxembourg Institute of Science and Technology (LIST) will be featured on the Science and Engineering Café as Scientist of the Week. I am very familiar with Nicolas’ work on plasma-assisted deposition of functional coatings and hope that we will learn more about his impressive research and career through his interview.
Dr. Nicolas Boscher is a Project Leader at the Luxembourg Institute of Science and Technology (LIST / http://www.list.lu). He received two M.Sc. in Materials Science and Chemistry from the University of Rennes 1 (France) in 2004 and his Ph.D. in Chemistry from the University College London in 2007, under the supervision of Prof. Ivan Parkin and Prof. Claire Carmalt. Subsequently, he joined the Centre de Recherche Public – Gabriel Lippmann (former name of the LIST) for a postdoctoral appointment in the group of Dr. Patrick Choquet, where he became a permanent researcher in 2011. In 2014, he joined the group of Prof. Karen Gleason at the Massachusetts Institute of Technology for a one-year visiting period.
Since his Ph.D. work, Dr. Boscher focused his research activities in the fields of Materials Science and Chemical Vapor Deposition (CVD), with particular emphasis on Atmospheric-Pressure Plasma-Enhanced CVD (AP-PECVD). He combines original CVD approaches with a great variety of precursors/monomers to provide the most innovative solutions towards functional coatings. His aim is to gain a fundamental understanding of the mechanisms driving the CVDs of thin films to tailor new smart materials for device fabrication.
Dr. Boscher has authored or co-authored over 45 research papers in peer reviewed journals, 23 as first author, and filed 8 patents, all dealing with CVD. Along his young scientific career, he established several durable international research collaborations, e.g. UCL, University of Mainz (Germany). He is currently the principal investigator of several research projects, from both competitive and industrial funding sources.